Maine Patent of the Month – December 2022

As we all learned in past years, wearing a face mask for too long can be uncomfortable. From the ear loops digging into your skin to the poorly contoured nose. dac3D, Inc. has recently patented a novel face mask design meant to be both easy to manufacture and comfortable to wear as long as you like.

The design uses an ear loop with a trap which the facemask fabric fits into. The trap includes two serrated holes so that the fabric goes in one and out the other, gripped by the teeth. This happens on both the left and right ear loop so that the wearer can easily tighten the fabric of the face mask as needed. Since the fabric can be replaced, any fabric can be used, adjusting for different levels of protection without compromising the comfort of the ear loops. It also allows the wearer to adjust the mask as needed to properly cover the nose and mouth without leaving gaps.

dac3D are experts in product design, development, 3D printing, and prototyping. Founded in Maine in 2016, the company focuses their efforts on the development and improvement of plastic products, simplifying the manufacturing process and improving quality.

Are you developing new technology for an existing application? Did you know your development work could be eligible for the R&D Tax Credit and you can receive up to 14% back on your expenses? Even if your development isn’t successful your work may still qualify for R&D credits (i.e. you don’t need to have a patent to qualify). To find out more, please contact a Swanson Reed R&D Specialist today or check out our free online eligibility test.

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Swanson Reed is one of the U.S.’ largest Specialist R&D tax advisory firms. We manage all facets of the R&D tax credit program, from claim preparation and audit compliance to claim disputes.

Swanson Reed regularly hosts free webinars and provides free IRS CE and CPE credits for CPAs. For more information please visit us at or contact your usual Swanson Reed representative.

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