Elemental Scientific has unveiled a groundbreaking method to analyze ultra-low concentration nanoparticles in semiconductor cleaning chemicals, addressing a critical need in advanced manufacturing. Utilizing single particle inductively coupled plasma mass spectrometry (spICP-MS), the innovation significantly enhances the precision of nanoparticle detection and characterization within complex chemical matrices. 

This novel method employs advanced algorithms to isolate and analyze ion signals from nanoparticles while eliminating background noise. Through iterative data filtering, a baseline intensity value is established, enabling accurate differentiation between ionic and particulate signals. The system then generates detailed histograms to determine nanoparticle detection thresholds, customized for various chemical matrices and analytes. These thresholds ensure reliable identification and quantification of nanoparticles, even at the smallest detectable sizes.

A major leap lies in the method’s adaptability. It accommodates diverse operational modes and analytes, including critical elements like silicon and gold, with detection capabilities reaching particle sizes as small as 5 nm. Moreover, it offers real-time monitoring of contamination trends, empowering proactive responses to potential metallic intrusions in semiconductor processes.

The spICP-MS system also optimizes efficiency, analyzing samples in durations as brief as three minutes or extended sessions for aggregated datasets. With capabilities for detailed characterization—including concentration, elemental composition, and size distribution—this invention promises transformative impacts on semiconductor quality assurance. 

By providing unparalleled sensitivity and accuracy, Elemental Scientific’s innovation sets a new benchmark in the analysis of ultra-low level nanoparticles, fortifying the technological backbone of semiconductor manufacturing and fostering advancements in nanoscale purity standards.

Are you developing new technology for an existing application? Did you know your development work could be eligible for the R&D Tax Credit and you can receive up to 14% back on your expenses? Even if your development isn’t successful your work may still qualify for R&D credits (i.e. you don’t need to have a patent to qualify). To find out more, please contact a Swanson Reed R&D Specialist today or check out our free online eligibility test.

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