Utah Patent of the Month – February 2024
SINTX Technologies, Inc. (SINTX) has a comprehensive suite of advanced ceramic technologies for use in the biomedical, antipathogenic, industrial, and armor industries. The company has been committed to research and development and creating new solutions since their inception. The company has recently been granted a patent for a new technology – antipathogenic face masks. This cutting-edge technology harnesses the power of silicon nitride to create a face mask that not only provides physical protection but actively inactivates harmful viruses.
The face mask is designed with a fibrous material layer infused with silicon nitride powder. What sets this mask apart is the strategic concentration of silicon nitride on the inner surface, ranging from about 1 wt. % to 15 wt. %. This concentration sweet spot, coupled with an average particle size of 0.6 μm to 5 μm, forms the foundation for the mask’s antiviral prowess.
The fibrous material, a spunbond nonwoven fabric, further enhances the mask’s structural integrity, ensuring comfort and effectiveness. SINTX has carefully considered the materials, incorporating polypropylene to reinforce the spunbond nonwoven fabric.
What’s truly remarkable is the silicon nitride’s ability to inactivate human viruses upon contact with the fibrous material layer. SINTX has integrated this antiviral face mask into a broader context of health and safety. The mask is not just a protective shield; it becomes a potent tool in the battle against viral transmission.
The versatility of this technology is evident in its application to a variety of devices, including medical equipment, filters, clothing, and even surfaces prone to contamination. Silicon nitride’s unique surface chemistry ensures a broad spectrum of antipathogenic properties, making it a valuable addition to the arsenal against viruses, bacteria, and fungi.
Are you developing new technology for an existing application? Did you know your development work could be eligible for the R&D Tax Credit and you can receive up to 14% back on your expenses? Even if your development isn’t successful your work may still qualify for R&D credits (i.e. you don’t need to have a patent to qualify). To find out more, please contact a Swanson Reed R&D Specialist today or check out our free online eligibility test.
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The Research & Experimentation Tax Credit (or R&D Tax Credit), is a general business tax credit under Internal Revenue Code section 41 for companies that incur research and development (R&D) costs in the United States. The credits are a tax incentive for performing qualified research in the United States, resulting in a credit to a tax return. For the first three years of R&D claims, 6% of the total qualified research expenses (QRE) form the gross credit. In the 4th year of claims and beyond, a base amount is calculated, and an adjusted expense line is multiplied times 14%. Click here to learn more.
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